Document Type : Original Research Paper
Department of Electrical Engineering, Rasht Branch, Islamic Azad University, Rasht, Iran
3 Smartec B. V. The Netherland, Electronic Instrumentation Laboratory, Delft University of Technology, the Netherlands 4 Department of Electrical Engineering, Guilan University, Rasht, Iran.
In this paper, we propose an innovative and low computational cost approach
that can be used to find optimal values of parameters of a nanoscale dual-gate
a tunneling field-effect transistor (DG-TFET). In this way, after obtaining analytical
expressions for potential and energy bands of the device using the Poisson
equation, the tunneling length is extracted at source-channel and channel-drain
tunnel junctions in the AMBIPOLAR, Off and On states. Due to the tunneling
length equation, the different values of gate work function and dielectric constant
of the device are swept to determine the minimum and maximum design
limits. According to the above range, the necessary checks are made to reach
the local optimal behaviors. These optimum points are explained based on the
achievement of optimal device performance. The accuracy and consistency of the
proposed model are validated with the TCAD simulation results. The present model
can be a handful for the study of TFET performance.